Wet Bench/Batch Wafer, Photoresist, & Substrate Cleaning Systems

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Batch Cleaning System

Wet Bench / Batch Cleaning Systems

When chemical pre-treatment is required before processing substrates in a manual system, UtE offers stand-alone Wet Bech systems to complement the process requirement.

A typical pre-treatment system consists of a manual load, polypropylene construction unit, with two process temperature controlled re-circulating tanks. Also included is a rinse tank - a standard Quick Dump Rinser - for final rinsing. Individual controllers mounted in the headcase provide the necessary controls for the process tank, the heater set-points, process times and drain activation.