ProductsSubstrate ETCHing And Photoresist Stripping SystemsWafer, Photomask,
& Substrate
Cleaning Systems
Manual Cleaning
Systems
Automated Cleaning
Systems
Wet Bench / Batch
Cleaning Systems / Alcohol Vapor Dryer
Reionizers & Mixing
Systems
Covered Chuck Spin
Coaters
Photoresist
Developer Stations
ETCH AND STRIP SYSTEM

Wafer, Photomask, & Substrate Cleaning Systems

Ultra T Equipment manufactures manual single/double-sided cleaning systems for the semiconductor and microelectronic industries. Specializing in wafer, photomask and substrate cleaning, UTE ulitizes single or double-sided high pressure DI nozzles, Atomizing Mist Nozzles, Brush, and Megasonic options.

MANUAL WAFER, PHOTOMASK, & SUBSTRATE CLEANING SYSTEMS
MANUAL WAFER, PHOTOMASK, & SUBSTRATE CLEANING SYSTEMS
  AUTOMATED WAFER, PHOTOMASK, & SUBSTRATE CLEANING SYSTEMS
AUTOMATED WAFER, PHOTOMASK, & SUBSTRATE CLEANING SYSTEMS
  WET BENCH/BATCH WAFER, PHOTOMASK, & SUBSTRATE CLEANING SYSTEMS
WET BENCH/BATCH WAFER, PHOTOMASK, & SUBSTRATE CLEANING SYSTEMS
Copyright © 2016 Ultra T Equipment Company, Inc., All Rights ReservedSite created by Thomas Web Solutions