Model PSC
605 - Double Sided Photomask / Substrate Cleaner
DESCRIPTION:
The Model PSC605 is a new microprocessor
controlled double-sided mask cleaner. This system uses high-pressure water jets
with pressures of up to 2000 PSI. This method has proven very effective in
cleaning photomasks. The system also uses a high-speed spin drying technique
with newly designed chucks. Photomasks are completely dry at the end of the
cycle. The microprocessor controller is a versatile, yet easy to use, industrial
system based on state-of-the-art technology. It operates in either a manual or
automatic mode.
FEATURES:
- Two high pressure D.I. water jet dispenses
with 0.2 µm
point-of-use filter.
- Two nitrogen blow-off nozzle
dispenses.
- Microprocessor control.
- Three (3) Adjustable Spin Speeds.
- D.I. water purge dispense.
OPTIONS:
- CO2 reionizer unit
- Dual brush assembly with 3 mil nylon bristles
with D.I. water and detergent dispenses
- Dual low pressure surfactant dispenses for
use instead of the brush assembly
- Liquid detergent dispensee with a 5-gallon
stainless steel canister with level alert
- Chamber rinse dispense
- Stainless steel chuck for two 4.0" x 4.0" x
0.060" and two 5.0" x 5.0" x 0.090" photomasks.
- Stainless steel chuck for three 5.0" x 5.0" x
0.060" photomasks
- Stainless steel chuck for three 5.0" x 5.0" x
0.090" photomasks
- Stainless steel chuck for two 6.0" x 6.0" x
0.090" photomasks
- Stainless steel chuck for two 6.0" x 6.0" x
0.120" photomasks
- Stainless steel chuck for one 7.0" x 7.0" x
0.150" photomasks