Model PRD
408 - Positive Resist Develop / Rinse Station
DESCRIPTION:
The highly efficient Model PRD408 is the ideal
solution for automatic batch develop and rinse of positive resist on wafers and
photomask. This very reliable and cost effective system utilizes one process
tank for both develop and rinse for Rapid and Effective processing of wafers.
Rapid fill and evacuation of both Developer and D.I.-H2O provides
for precise control of cycle times. The developer is continuously filtered and
automatically replenished and the temperature is accurately maintained for
reliable and repeatable process.
FEATURES:
- Up to Eight (8) Inch Wafer
Compatibility
- High Volume Developer Fill for Rapid Emersion
of Wafers and Engineered to Minimize Foaming
- Temperature Range of 50 to 100 degrees F with
Resolution at ±0.3 degrees F
- Adjustable Mechanical Agitation for Uniform
Developing
- Large Quick Dump Valve for Rapid Evacuation
of Developer at End of Develop Cycle
- Six D.I.-H2O Spray Nozzles for Fast
Effective Termination of Develop Cycle
- Rapid Fill and Dump of D.I.-H2O for Fast
Cycle
- Spray Assembly using Reservoir Developer for
Elimination of Water from Process Tank and Maintenance of Developer Normality
- Nitrogen Barrier at Reservoir for Developer
Isolation
- Automatic Replenish for Maintenance of
Normality
- 0.45 µm Filtration of Developer
- Programmable Microprocessor Controlled
Process
OPTIONS:
- Dual 5 Gallon Developer Dispense Canister
with Level Alert
- Baskets for up
to two boats of up to 6" wafers and one boat of 8" wafers