ProductsSubstrate ETCHing And Photoresist Stripping SystemsWafer, Photomask,
& Substrate
Cleaning Systems
Manual Cleaning
Systems
Automated Cleaning
Systems
Wet Bench / Batch
Cleaning Systems / Alcohol Vapor Dryer
Reionizers & Mixing
Systems
Covered Chuck Spin
Coaters
Photoresist
Developer Stations
ETCH AND STRIP SYSTEM

Photoresist Developer Stations

(click on thumbnail to enlarge)

UtE Models PRD405/408/409 Photoresist Developer Stations

Click to enlarge
PRD405/408 Photoresist Developer Station
Click to enlarge
DRS409 Photoresist Developer Station

Models PRD405/408/409 are the ideal solution for automatic batch develop and rinse of positive photoresist on wafers and photomasks. This very reliable and cost effective system utilizes one process tank for both develop and rinse for Rapid and Effective processing of wafers. Rapid fill and evacuation of both Developer and D.I. Water provides for precise control of cycle times. The developer is continuously filtered and automatically replenished and the temperature is accurately maintained for reliable and repeatable process.

 

UtE Model SCSeD Photoresist Developer Stations

Click to enlarge
SCSe433 Photoresist Developer Station
Click to enlarge
SCSe126 Photoresist Developer Station

Model SCSe series Developer Station is usually preferred for Single Substrate Developing. The SCSe could be configured with several options from many different  Developer Dispenses nozzles, Low Pressure DI Dispenses, Atomizing Nozzles, Megasonic Pies and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds, optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.

 

Models Tank Size Maximum Substrate Size Max Spindle Speed Acceleration Recipes Dispenses Brochure
405 6" Wafer Cassette N/A N/A N/A Up to 3 N/A PDF (88.0KB)
408/409 8" Wafer Cassette N/A N/A N/A Up to 3 N/A PDF (86.6KB)
SCSe Single Substrate Up to23" on the Diagonal 10 to 2000 RPM +/- 1 500 RPM/s Up to 10 5 PDF (96.9KB)

Get Adobe Reader

Copyright © 2016 Ultra T Equipment Company, Inc., All Rights ReservedSite created by Thomas Web Solutions