- Cleaning Systems -
Cleaning systems for a variety of substrate sizes, up to twenty three inches (23") on the diagonal/diameter that provide for uniform application of High Pressure and/or Megasonic de-ionized H2O dispensed. Plumbed for submicron application, having all Teflon lines and stainless or Teflon valves. Optional brushes, with surfactant dispense are available, as are low pressure dispenses of surfactant and/or chemistries for one step cleaning. Rapid acceleration and excellent exhaust along with N2 dry assist provide for short and thorough drying cycle. To thoroughly eliminate potential electrostatic buildup an N2 ionizer unit and antistatic materials are available.
Automated Cassette-to-Cassette Double Sided Systems >>